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Research
Description
Our research interests are directed at both synthesizing new electronic
materials and developing novel processing techniques. Materials of interest
include transparent conducting oxides (TCOs), wide bandgap semiconductors
for photovoltaic applications, and advanced polymers. Primary deposition
techniques for these thin film materials are thermal and plasma-enhanced
chemical vapor deposition. Investigation of thermal CVD is guided by detailed
reactive flow modeling and experimental measures of both gas-phase and
surface kinetics. PECVD is a more complex phenomena, and we take a semi-empirical
approach using statistically designed experiments. In both cases in-situ
process diagnostics and ex-situ materials characterization are
used to develop fundamental models that yield process-structure-performance
relationships. Process diagnostics include mass spectrometry, optical
emission spectroscopy (OES), and optical reflectometry/transmission. Routine
characterization techniques include:
- Electrical
Properties: C-V, I-V, 4 point probe, Hall effect, photovoltaic performance
- Optical
Properties: Variable angle spectroscopic ellipsometry (VASE), UV-VIS-IR
spectrophotometry
- Structural
Properties: X-ray diffraction (XRD), atomic force microscopy (AFM),
and scanning electron microscopy (SEM)
- Film Composition:
X-ray
photoelectron spectroscopy (XPS), Fourier-transform infrared spectroscopy
(FTIR), secondary ion mass spectrometry (SIMS)
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