Modules 5 and 6:

(5) Mask alignment, capacitors and Schottky barriers, electrical characterization

Goals:

• Aligh a mask for photolithographic patterning over a previously formed pattern
• Use a thermal evaporator to deposit metal contacts
• Fabricate Schottky barrier diodes and MOS capacitors
• Characterize the diodes and capacitors by I-V and C-V techniques

Procedures

(6) Ohmic Contacts, pn junctions, and electrical characterization

Goals:

• Make Al ohmic contacts to doped layers and pn junctions structures
• Characterize contact resistance
• Isolate diodes by plasma etching
• Characterize pn junction diodes by I-V and C-V techniques

Procedures