This AG Associates RTP unit was donated to the school in 2000 by the Motorola Foundation. The system is equipped with electronic mass flow controllers is to programmable mixtures of O2, N2, and Ar. The robotic wand (center) automatically takes wafers from the rack on the right, inserts them into the oven, and then place them on the stage to the left. The RTP unit is employed for oxidation (< 500 Å) and for thermal diffusion steps. The unit is capable of ramping to 1400 ºC in 10 seconds and maintaining the temperature for up to five minutes.