Modules 3 and 4:
(3) Mask Making, Photolithography, Wet Oxide Etching
Goals:
- Design a mask set for photolithographic patterning
- Learn how to use a mask aligner.
- Determine optimum exposure time for positive photoresist..
- Etch silicon dioxide in Buffered Oxide Etch (BOE).
- Determine oxide thickness physically
Procedures
(4) Diffusion, Sheet Resistance, and evaporation
Goals:
- Learn to measure Sheet Resistance - Rs
- Learn how to apply spin-on-dopants.
- Determine the sheet resistance of doped films as a function of doping temperature.
- Learn to estimate the resistivity and junction depth.
- Learn how to deposit metallic films using a thermal evaporator.
Procedures