Name: __________________________

1. The RCA clean has 3 steps. Name them and describe their function

i.)

ii.)

iii.)

You have grown a layer of silicon oxide that is 1500 Å thick.

2. How much (thickness) silicon was oxidized?

 

 

3. Using rate constants from Campbell estimate how long it took to grow this film from clean silicon in dry oxygen at T = 1100 ºC?

 

 

 

 

4. Similarly, estimate how long the process would take in steam at T = 1000 ºC?

 

 

 

 

5. Looking at your wafer under white fluorescent lighting, what color is it? What phenomenon causes these colors?