Recent Publications 

  1. "The effect of wall conditions on the self-limiting growth of metal oxides by pulsed plasma-enhanced chemical vapor deposition", S. F. Szymanski, M. T. Seman, and C. A. Wolden, J. Vac. Sci. Technol. A 25, 1493 (2007). Journal Link

  2. “Plasma and gas-phase characterization of a pulsed plasma-enhanced chemical vapor deposition engineered for self-limiting growth of aluminum oxide thin films”, S. F. Szymanski, M. T. Seman, and C. A. Wolden, Surf. Coat. Technol. 201, 8991 (2007). Journal Link

  3. “Optimizing the dielectric performance of TiO2 thin films through control of plasma-enhanced chemical vapor deposition process conditions, J. Vac. Sci. Technol. A 25, 1298 (2007). Journal Link

  4. “Self-limiting growth of tantalum oxide thin films by pulsed plasma-enhanced chemical vapor deposition”, M. Seman, J. J. Robbins, S. Agarwal, and C. A. Wolden, Appl. Phys. Lett. 90, 131504 (2007). Journal Link

  5. “Plasma-enhanced chemical vapor deposition of TiO2 thin films for dielectric applications”, W. Yang and C. A. Wolden, Thin Solid Films 515, 1708 (2006). Journal Link

  6. “An investigation of annealing on the dielectric performance of TiO2 thin films”, W. Yang, J. Marino, A. Monson and C. A. Wolden, Semicond. Sci. Technol. 21, 1573 (2006). Journal Link

  7. “Plasma-assisted co-evaporation of thin film semiconductors”, S. Kosaraju, J. A. Harvey, and C. A. Wolden,  Vac. Technol. Coat. 7, 48 (2006). (This paper was the featured story for the issue and it also graced the cover)  Journal Link

  8. “The role of argon in plasma-assisted deposition of indium nitride”, S. Kosaraju, J. A. Marino, J. A. Harvey, and C. A. Wolden, J. Cryst. Growth 286, 400 (2006). Journal Link

  9. “Plasma-assisted co-evaporation of b-indium sulfide thin films”, S. Kosaraju, J. A. Marino, J. A. Harvey, and C. A. Wolden, Sol. Energy Mater. Sol. Cells, 90, 1121 (2006). Journal Link

  10. “An investigation of the role of plasma conditions on the deposition rate of electrochromic vanadium oxide thin films” M. Seman, J. Marino, W. Yang and C. A. Wolden, J. Non-Cryst. Solid 351, 1987 (2005.) Journal Link

  11. “Formation of chalcogen containing plasmas and their use in the synthesis of photovoltaic absorbers”, S. Kosaraju, I. Repins and C. A. Wolden, J. Vac. Sci. Technol. A 23, 1202 (2005). Journal Link

  12. “On the formation and stability of p-type conductivity in nitrogen doped zinc oxide”, T. M. Barnes,  K. Olson, and C. A. Wolden, Appl. Phys. Lett. 86, 112112 (2005).  Journal Link

  13. “Real time measurement of hydrogen generated free carriers in polycrystalline ZnO thin films at room temperature”, C. A. Wolden, T. M. Barnes, J. B. Baxter, and E. S. Aydil, J. Appl. Phys. 97, 043522 (2005). Journal Link

  14. “Room temperature chemical vapor deposition of c-axis ZnO”, T. M. Barnes, J. Leaf, C. Fry, and C. A. Wolden, J. Cryst. Growth 274 412 (2005). Journal Link

  15. “The role of oxygen dissociation in plasma enhanced chemical vapor deposition of zinc oxide from oxygen and diethyl zinc”, C. A. Wolden, Plasma Chem. Plasma Process. 25, 169 (2005). Journal Link

  16. “Transport phenomena in high performance nanocrystalline ZnO:Ga films”, J. J. Robbins, J. Harvey, J. Leaf, C. Fry, and C. A. Wolden, Thin Solid Films 473, 35 (2005). Journal Link

  17. “A comparison of plasma-activated N2/O2 and N2O/O2 mixtures for use in ZnO:N synthesis by chemical vapor deposition”, T. M. Barnes, J. Leaf, S. Hand, C. Fry, and C. A. Wolden, J. Appl. Phys. 96, 7036 (2004). Journal Link

  18. “ZnO synthesis by high vacuum plasma-assisted chemical vapor deposition using dimethylzinc and atomic oxygen”, T. M. Barnes, S. Hand, J. Leaf, and C. A. Wolden, J. Vac. Sci. Technol. A 22, 2118 (2004). Journal Link

  19. “An experimental and modeling analysis of vapor transport deposition of cadmium telluride”, J. M. Kestner, S. McElvain, S. Kelly, L. M. Woods, T. R. Ohno, and C. A. Wolden, Sol. Energy Mater. Sol. Cells 83, 55 (2004). Journal Link

  20. “Characterization of ion diffusion and transient electrochromic performance in PECVD grown tungsten oxide thin films”, M. Seman and C. A. Wolden, Sol. Energy Mater. Sol. Cells 82, 517 (2004).  Journal Link

  21. “An interrogation of the zinc oxide-gallium oxide phase space by plasma-enhanced chemical vapor deposition”, J. J. Robbins, C. Fry, and C. A. Wolden, J. Cryst. Growth, 263, 283, (2004). Journal Link 

  22. “High mobility oxides: engineered structures to overcome intrinsic performance limitations”, J. J. Robbins and C. A. Wolden, Appl. Phys. Lett. 83, 3933, (2003). Journal Link

  23. “An investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide films”, M. Seman and C. A. Woldem, J. Vac. Sci. Technol. A 21, 1927 (2003). Journal Link

  24. “An investigation of the plasma chemistry involved in the synthesis of ZnO by plasma-enhanced chemical vapor deposition”, J. J. Robbins, J. Esteban, C. Fry, and C. A. Wolden, J. Electrochem. Soc. 150, C693 (2003). Journal Link