Instruments
To download a printable PDF of all SIF instruments click here: SIF INSTRUMENTATION
ASYLUM MFP-3D SCANNING PROBE MICROSCOPE
The Asylum MFP-3D atomic force microscope is coupled to an optical microscope (Olympus) for simultaneous imaging and physical properties measurements at the nanoscale for a wide range of advanced materials in renewable energy and life sciences.
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Digital Instruments AFM
The D-600 stylus profilometer is an instrument used to measure a surface’s profile to quantify its roughness and step heights. The D-600 profilometer can measure fluctuations in surface profile from 1200um down to the nanometer scale.
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FEI Helios Nanolab 600I FIB/SEM
High-performance DualBeam system containing a Ga+ focused ion beam (500eV–30keV) together with a FEG extreme high-resolution scanning electron microscope and Si-drift EDX detector for element analyses.
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FEI Quanta 600I Environmental SEM
Scanning electron microscope with various operating modes for different types of samples.
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FEI TALOS F200X TEM/STEM
Field emission scanning/transmission electron microscope for characterization of various materials. It has a high brightness field emitter and four EDX detectors for fast compositional mapping. It can achieve a resolution around 0.1 nanometers.
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FEI TECNAI T12
A 120 kV transmission electron microscope equipped with an EDX detector.
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JEOL JSM-7000F FIELD EMISSION SEM
Field-emission scanning electron microscope equipped for EDS and EBSD analysis.
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Keyence VHX-5000
The Keyence VHX-5000 is a digital optical microscope with up to 5000X zoom, 2D and 3D image stitching capabilities, and measurement analysis software.
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Phenom SEM
The Phenom Scanning Electron Microscope is a tabletop SEM which features combined optical- electron images for easy sample navigation. It is designed for ease of use and rapid sample loading. It can achieve up to 100,000 X magnification with resolution down to 15nm.
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Profilometer
The D-600 stylus profilometer is an instrument used to measure a surface’s profile to quantify its roughness and step heights. The D-600 profilometer can measure fluctuations in surface profile from 1200um down to the nanometer scale.
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TESCAN S8252G RAMAN-SEM/FIB
Ultra-high resolution variable pressure field emission scanning electron microscope/Ga+ focused ion beam instrument with in-situ Raman imaging. Allows for correlated optical/Raman imaging, SEM imaging, EDX mapping, and sample milling along with W and Co deposition (GIS) capabilities.
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WITEC LASER CONFOCAL RAMAN MICROSCOPE
This instrument is a WITec Alpha300 is a 532 nm laser confocal microscope equipped with a Raman spectrometer for point, line, area, and volume Raman scans.
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CAMECA LEAP 4000X SI
The LEAP 4000X Si local electrode atom probe provides 3D nanoscale compositional analysis. Mass spectral data obtained through time-of-flight measurements can be used to identify light mass and heavy mass species (hydrogen out to >1000 Da) with equivalent sensitivity. The mass resolution is sufficient for distinguishing isotopic abundances. The instrument features both laser pulsing and voltage pulsing along with a 90 mm to 160 mm variable flight path.
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IONTOF TOF-SIMS.V
Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a highly surface-sensitive analytical technique used to obtain elemental, isotopic and molecular information from the surface of solid materials and compacted powders.
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Sciex 5500 Triple Quad
This liquid chromatography-mass spectrometer is a highly sensitive instrument for detecting and quantifying known compounds within a liquid sample.
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Sciex x500R QToF
A Quadrupole Time-of-Flight Mass Spectrometer is a highly sensitive liquid chromatography-mass spectometry system that can be very beneficial in non-target analysis involving screening a sample for a multitude of unknown compounds.
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ABM UV Mask Aligner
The ABM mask aligner features an intensity-controlled 6"x6" illumination area, strong illumination at both 400 and 350, two simultaneous operating alignment cameras, auto-leveling sample mount, micrometer adjustments, and semiautomatic operation. It is currently set up for use with 4" masks and <1" samples but adjustments can be made upon request.
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AutoGlow 200 Reactive Ion Etcher
The AutoGlow 200 reactive ion etcher is a table-top plasma system that can be used for plasma cleaning or RIE processing with O2 and SF6 plasmas. It can process as low as 10 W, or as high as 300 W in one-watt increments. The AutoGlow 200 is suitable for lab, failure analysis, or production applications. It can perform a host of applications, including cleaning, removing photoresist, prebonding, organic removal, activation and plasma etching.
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Cleanrooms
Two Class 1,000 clean rooms with nanofabrication and photolithography capabilities for substrates up to 3” (76mm) in diameter and feature resolution down to 2μm.
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Furnaces
The facilities houses a complete suite of furnaces, including wet/dry oxidation, vacuum, diffusion, rapid thermal and high temperature.
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Karl Suss Mask Aligner
Two Karl Suss MJB3 UV400 Mask Aligners are available for photolithography, which is a microfabrication process used to selectively remove parts of a thin film to create a pattern or a design onto a substrate by means of UV lamp. It fits substrates up to 6" x 6" and exposes with a UV400nm source at 250W.
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Wire Bonder
The TPT hb05 is a benchtop manual wire bonding system with gold, silver, aluminum or copper wire and a 6:1 mouse ratio. Ideal for attaching gold contact wires to microscopic features for electrical measurement.
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Surface Characterization Laboratory
The Surface Characterization Lab houses an AFM, SEM, UV-VIS spectroscopy system, and profilometer, as well as probe station for electrical measurements.
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Solar Simulator
A PV Measurements inc. 1000W class A solar simulator with 16 cm x 16 cm uniform area calibrated to an AM1.5 spectrum. It has an automated measurement program to perform current voltage sweeps. The system is also equipped with external quantum efficiency measurement setup.
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AJA Sputtering System
The AJA is a 4-gun magnetron sputtering system with a sputter-up configuration. The system has the capability to perform RF sputtering deposition for the deposition of ceramic materials, is configured to deposit magnetic materials, and can sputter multiple materials simultaneously.
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Angstrom Thermal Evaporator
The Angstrom thermal evaporator is a thermal evaporation system dedicated to the evaporation of metals (gold, silver, aluminum, and copper.) It has an automated deposition rate controller for ease of use and the creation of consistent reproduceable films.
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Tabletop Gold Sputter Coater
The Denton nanocoater is a rapid deposition sputtering system configured to deposit a 20nm gold coating on samples in order to prevent surface oxidation or to provide surface conductivity for e-beam measurements.
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High Temperature Thermal Evaporator
In thermal evaporation, a source material is evaporated in a vacuum through the application of a large applied current. The vacuum allows vapor particles to travel directly to the substrate, where they condense back to a solid state. The Large thermal evaporator has 4 material holders which can be used for a variety of evaporable materials, and a large substrate mount that can hold 16 3”x3” substrates.
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AJA UHV Multi-Technique Deposition System
Ultra High Vacuum thin film deposition system with a 6 pocket e-beam source, 5 magnetron sputtering sources, and an ion gun source.
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Semicore Sputtering System
The Semicore is a 3-gun magnetron DC sputtering system with a sputter-down configuration for the deposition of high melting point metals. The system has the capability to do subsequent layered deposition of multiple metals.
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Panalytical Empyrean X-ray Diffractometer
X-ray diffractometer that provides crystallographic and compositional information critical to understanding part mechanical performance.
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PANALYTICAL X’PERT PRO X-RAY DIFFRACTOMETER
Equipped with a versatile computer-controlled diffractometer and is ideal for routine XRD analysis of powder/polycrystalline specimens
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Zeiss Versa 520 XCT
3D X-ray microscope that enables cutting-edge, nondestructive tomographic imaging and grain reconstruction.
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Rocky Mountain Environmental XPS User Facility
The Rocky Mountain E-XPS extends capabilities of traditional UHV XPS systems by enabling measurements at various pressures and temperatures, and with variable chemical compositions. The Rocky Mountain E-XPS can therefore look at surface states for functional materials in relevant environments and with optional electronic biasing for analysis of non-equilibrated surface states.
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