Raith Voyager E-beam Lithography System

raith_ebeam-1-scaled Raith Voyager E-beam Lithography System

Location

CoorsTek 001-M

Contact

Alex Dixon – agdixon@mines.edu

Instrument Details

The Raith Voyager is a cutting-edge electron beam lithography system designed to deliver high-resolution patterning for advanced nanofabrication applications. Built for precision and scalability, it is ideal for creating photonic devices, high-frequency electronics, and nanostructures with sub-10 nm accuracy.

Equipped with proprietary technologies, the Voyager offers seamless operation with features like stitching-error-free patterning and automated workflows, ensuring consistent results for demanding research and industrial needs.

Key Features

  •  50 keV Field Emission Electron Beam
    •  50 mega-Hertz deflection system with real-time dynamic corrections
    • Single stage electrostatic deflection to define single line patterns in high end resists as small as 8 nm
    • Laser interferometric corrected stage movement for continuous stitching on large area patterns.
  • Multi-Sample Handling
    • Accommodates full 4″ wafers, up to  8 2″ wafers, or a variety of wafer pieces.  samples with a motorized multi-sample holder.
    • Automated laser leveling and alignment for consistent exposure quality.
  • User-Friendly Interface
    • Automated beam focus, stigmation, and field alignment processing.
    • Built in pattern editing software and NanoPECS for Accurate proximity-effect correction of nanoscale structures
    • cutting edge ALGORITHMIXX package allows for rapid processing of large area algorithmically defined patterns
    • Job Manager allows for multi-user sequential job execution

Specifications

  • Beam Energy: 50 keV beam with adjustable current for precise resist compatibility.
  • <strongPatterning Accuracy: Sub-100 nm resolution with provided PMMA resists, Higher accuracy possible with user provided resists.</strong
  • Exposure Speed: Up to 1 cm² per minute.
  • Sample Size: Multi-sample holder supports varied substrate dimensions.

Applications

  • High-resolution photonic device fabrication.
  • High-frequency electronic component manufacturing.
  • Large-area metalens patterning.
  • Advanced metamaterials and nanostructure research.
microscope1 Raith Voyager E-beam Lithography System

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Money-copy Raith Voyager E-beam Lithography System

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