Nanyte Beam UV – Laser Lithography
Instrument Details
The Nantye beam is a desktop, maskless lithography tool enabling at will nanopatterning without the use of a photomask. The tool can write patterns with a minimum linewidth of 1um, with 0.1um resolution over a 400um writefield and write full patterns over a full 4″ wafer. Patterns can be free drawn, created from GDS files, or imported from image files. This easy to use lithography system is ideal for rapid prototyping, patterning on 2D materials, or patterning small area devices.
The image above is an example of the what this system can write. The logo is approximately the width of a human hair (50um)
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