AutoGlow 200 Reactive Ion Etcher
AutoGlow 200 Reactive Ion Etcher
Location
Hill Hall 312
Contact
Alex Dixon – agdixon@mines.edu
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INSTRUMENT DETAILS
The AutoGlow 200 reactive ion etcher is a table-top plasma system that can be used for plasma cleaning or RIE processing with O2 and SF6 plasmas. It can process as low as 10 W, or as high as 300 W in one-watt increments. The AutoGlow 200 is suitable for lab, failure analysis, or production applications. It can perform a host of applications, including cleaning, removing photoresist, prebonding, organic removal, activation and plasma etching.